Damage nucleation and vacancy-induced structural transformation in Si grain boundaries

Citation
A. Maiti et al., Damage nucleation and vacancy-induced structural transformation in Si grain boundaries, APPL PHYS L, 75(16), 1999, pp. 2380-2382
Citations number
16
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS LETTERS
ISSN journal
00036951 → ACNP
Volume
75
Issue
16
Year of publication
1999
Pages
2380 - 2382
Database
ISI
SICI code
0003-6951(19991018)75:16<2380:DNAVST>2.0.ZU;2-O
Abstract
Atomic resolution Z-contrast scanning transmission electron microscopy reve als preferential nucleation of electron-beam-induced damage in select atomi c columns of a Si tilt grain boundary. Atomic scale simulations find that t he region of initial damage nucleation corresponds to columns where the for mation energies of vacancies and vacancy complexes are very low. The calcul ations further predict that vacancy accumulation in certain pairs of column s can induce a structural transformation to low-density dislocation "pipes" with all atoms fourfold coordinated. (C) 1999 American Institute of Physic s. [S0003-6951(99)00742-1].