Ja. Garrido et al., Polarization fields determination in AlGaN/GaN heterostructure field-effect transistors from charge control analysis, APPL PHYS L, 75(16), 1999, pp. 2407-2409
AlxGa1-xN/GaN heterostructure field-effect transistors with different Al co
ncentrations (0.15 < x < 0.25) and barrier widths (150 Angstrom < W-B< 350
Angstrom) have been fabricated and characterized. Experimental results were
analyzed by using a self-consistent solution of the Schrodinger and Poisso
n equations with the proper boundary conditions. The total (piezoelectric a
nd spontaneous) polarization has been included as a fitting parameter in th
e self-consistent calculations. From the analysis of the transistor charge-
control experimental data, a linear increase of the polarization field with
the Al concentration has been found. Our results indicate that the slope o
f such dependence, and the magnitude of the total polarization field are lo
wer than the predicted ones using the usually accepted values of the piezoe
lectric and spontaneous polarization coefficients. (C) 1999 American Instit
ute of Physics. [S0003-6951(99)00642-7].