Polarization fields determination in AlGaN/GaN heterostructure field-effect transistors from charge control analysis

Citation
Ja. Garrido et al., Polarization fields determination in AlGaN/GaN heterostructure field-effect transistors from charge control analysis, APPL PHYS L, 75(16), 1999, pp. 2407-2409
Citations number
17
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS LETTERS
ISSN journal
00036951 → ACNP
Volume
75
Issue
16
Year of publication
1999
Pages
2407 - 2409
Database
ISI
SICI code
0003-6951(19991018)75:16<2407:PFDIAH>2.0.ZU;2-V
Abstract
AlxGa1-xN/GaN heterostructure field-effect transistors with different Al co ncentrations (0.15 < x < 0.25) and barrier widths (150 Angstrom < W-B< 350 Angstrom) have been fabricated and characterized. Experimental results were analyzed by using a self-consistent solution of the Schrodinger and Poisso n equations with the proper boundary conditions. The total (piezoelectric a nd spontaneous) polarization has been included as a fitting parameter in th e self-consistent calculations. From the analysis of the transistor charge- control experimental data, a linear increase of the polarization field with the Al concentration has been found. Our results indicate that the slope o f such dependence, and the magnitude of the total polarization field are lo wer than the predicted ones using the usually accepted values of the piezoe lectric and spontaneous polarization coefficients. (C) 1999 American Instit ute of Physics. [S0003-6951(99)00642-7].