A technique for evaluating optical confinement in GaN-based lasing structures

Citation
S. Bidnyk et al., A technique for evaluating optical confinement in GaN-based lasing structures, APPL PHYS L, 75(15), 1999, pp. 2163-2165
Citations number
10
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS LETTERS
ISSN journal
00036951 → ACNP
Volume
75
Issue
15
Year of publication
1999
Pages
2163 - 2165
Database
ISI
SICI code
0003-6951(19991011)75:15<2163:ATFEOC>2.0.ZU;2-S
Abstract
We present a technique for evaluating optical confinement in GaN-based lasi ng structures by studying their spectrally resolved near-field pattern unde r high optical excitation. Emission spectra were found to be strongly depen dent on the position of the collection optics relative to the active region when the sample was excited above the lasing threshold. The spatially reso lved spectra contain a modulation signature that can be used to deduce the optical confinement characteristics. We show that the observed index-guided modes result from multiple internal reflections at angles very close to th e critical angle for total internal reflection between the semiconductor la yers with different refractive indices. This technique was used to evaluate the degree of optical confinement in GaN epilayers and GaN/AlGaN separate confinement heterostructures. The implications of this study on the design of GaN-based laser diodes are discussed. (C) 1999 American Institute of Phy sics. [S0003-6951(99)00941-9].