D. Hahnel et al., Role of plasmalogens in the enhanced resistance of LDL to copper-induced oxidation after LDL apheresis, ART THROM V, 19(10), 1999, pp. 2431-2438
Extracorporeal reduction of plasma low density lipoproteins (LDLs) by LDL a
pheresis was shown to attenuate the proatherogenic influences of LDL, such
as impairment of vasodilation and increased monocyte adhesion to the endoth
elium. In 16 patients with familial hypercholesterolemia, we analyzed wheth
er LDL apheresis by the heparin precipitation procedure affected the oxidat
ive resistance of LDL. Plasma LDL cholesterol concentrations were reduced b
y 65% after the apheresis. The lag time of copper-mediated LDL oxidation wa
s increased from 103 to 117 minutes (P<0.0005). The LDL contents of alpha-t
ocopherol and beta-carotene, as well as the ratio of monounsaturated to pol
yunsaturated fatty acids in LDL, were not altered. However, the LDL apheres
is induced a 15% increase in the LDL contents of plasmalogen phospholipids
(P<0.0005), a class of ether phospholipids that were recently shown to prev
ent lipid oxidation. The phosphatidylcholine (PC) to lysoPC ratio was eleva
ted by 16% after the apheresis (P<0.0005). The percent increase in LDL plas
malogen phospholipids showed a close association with the increased lag tim
e after apheresis (P<0.0005). The LDL plasmalogen contents of the blood sam
ples from patients and from normolipidemic donors were also positively rela
ted to the lag time (P<0.005). In vitro loading of LDL with plasmalogen pho
spholipids resulted in a prolongation of the lag time and an increase in th
e PC/lysoPC ratio. In conclusion, the rapid rise in LDL contents of plasmal
ogen phospholipids most probably causes the increase in lag time after LDL
apheresis. Plasmalogens appear to play an important role in the oxidation r
esistance of LDL in vivo.