Citation
Pj. Van Der Put et al., Irreversible kinetics in CVD: A reinterpretation of titanium nitride and tungsten formation, CHEM VAPOR, 5(5), 1999, pp. 211-218
Citations number
26
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
CHEMICAL VAPOR DEPOSITION
ISSN journal
09481907
→ ACNP
Volume
5
Issue
5
Year of publication
1999
Pages
211 - 218
Database
ISI
SICI code
0948-1907(199910)5:5<211:IKICAR>2.0.ZU;2-W
Abstract
A phenomenological model is proposed to describe the chemistry in CVD. The
model takes account of the typical characteristics of CVD and is based on i
rreversible gas-surface reactions. To show its possibilities the model is u
sed to derive rate coefficients from the observed kinetics of titanium nitr
ide and tungsten deposition. It might become a simple and efficient tool to
design deposition reactions for novel coatings.