C-axis current-voltage characteristics of mesa structures on Bi2Sr2CaCu2O8+delta single crystals fabricated by a simple technique without photolithography

Citation
Yj. Feng et al., C-axis current-voltage characteristics of mesa structures on Bi2Sr2CaCu2O8+delta single crystals fabricated by a simple technique without photolithography, CHIN PHYS L, 16(9), 1999, pp. 686-688
Citations number
14
Categorie Soggetti
Physics
Journal title
CHINESE PHYSICS LETTERS
ISSN journal
0256307X → ACNP
Volume
16
Issue
9
Year of publication
1999
Pages
686 - 688
Database
ISI
SICI code
0256-307X(1999)16:9<686:CCCOMS>2.0.ZU;2-O
Abstract
A simple technique-is reported for fabricating the mesa structure on Bi2Sr2 CaCu2O8+delta single crystal. In the patterning process, metal masks are us ed instead of photolithography and argon ion milling is applied to form the small mesa on the Bi2Sr2CaCu2O8+delta crystal surface, Real four-probe tra nsport measurements are made on the mesa structure and typical c-axis curre nt-voltage (I-V) characteristics of the intrinsic Josephson effect have bee n observed. The superconducting gap parameter can be extracted from the mul ti-branch structure in the I-V characteristics. Additionally, from the stro ng hysteresis in the I-V characteristics, the capacitance C-J of the unit i ntrinsic Josephson junction has been estimated to be 2.3pF, which is in goo d agreement with that evaluated from the geometric parameters of the unit f unction between the two copper oxide layers.