C-axis current-voltage characteristics of mesa structures on Bi2Sr2CaCu2O8+delta single crystals fabricated by a simple technique without photolithography
Yj. Feng et al., C-axis current-voltage characteristics of mesa structures on Bi2Sr2CaCu2O8+delta single crystals fabricated by a simple technique without photolithography, CHIN PHYS L, 16(9), 1999, pp. 686-688
A simple technique-is reported for fabricating the mesa structure on Bi2Sr2
CaCu2O8+delta single crystal. In the patterning process, metal masks are us
ed instead of photolithography and argon ion milling is applied to form the
small mesa on the Bi2Sr2CaCu2O8+delta crystal surface, Real four-probe tra
nsport measurements are made on the mesa structure and typical c-axis curre
nt-voltage (I-V) characteristics of the intrinsic Josephson effect have bee
n observed. The superconducting gap parameter can be extracted from the mul
ti-branch structure in the I-V characteristics. Additionally, from the stro
ng hysteresis in the I-V characteristics, the capacitance C-J of the unit i
ntrinsic Josephson junction has been estimated to be 2.3pF, which is in goo
d agreement with that evaluated from the geometric parameters of the unit f
unction between the two copper oxide layers.