SUBSTRATE AND COATING DAMAGE BY ARCING DURING SPUTTERING

Citation
C. Mitterer et al., SUBSTRATE AND COATING DAMAGE BY ARCING DURING SPUTTERING, Surface & coatings technology, 89(3), 1997, pp. 233-238
Citations number
18
Categorie Soggetti
Materials Science, Coatings & Films
ISSN journal
02578972
Volume
89
Issue
3
Year of publication
1997
Pages
233 - 238
Database
ISI
SICI code
0257-8972(1997)89:3<233:SACDBA>2.0.ZU;2-F
Abstract
Arcing during PVD processes using d.c. glow discharges and the defects formed at the substrate are a major drawback in the application of ha rd wear- and corrosion-resistant coatings. This work focuses on a more complete understanding: of the interrelationships between substrate a rcing and surface quality of the coating. Intense substrate arcing and the surface defect density were characterized using a current-Voltage transformer and a quantitative image analysing system connected to an optical microscope. The major defects formed during the etching proce ss are craters and canyons resulting from arcs ignited between the sub strate and the anode. During deposition the surface quality of the coa ting is mainly determined by droplets ejected from the target due to a rcing between target and anode. Optimization of the deposition paramet er of argon pressure seems to be suitable to minimize the density of t hese defects. (C) 1997 Elsevier Science S.A.