SHALLOW DONORS IN EPITAXIAL GAN

Citation
S. Fischer et al., SHALLOW DONORS IN EPITAXIAL GAN, Materials science & engineering. B, Solid-state materials for advanced technology, 43(1-3), 1997, pp. 192-195
Citations number
15
Categorie Soggetti
Material Science","Physics, Condensed Matter
ISSN journal
09215107
Volume
43
Issue
1-3
Year of publication
1997
Pages
192 - 195
Database
ISI
SICI code
0921-5107(1997)43:1-3<192:SDIEG>2.0.ZU;2-B
Abstract
Photoluminescence (PL) of GaN is commonly dominated by the annihilatio n of excitons bound to a 34.5 meV deep donor appearing at 3.472 eV (fo r strain free GaN at 4 K), With PL we were able to resolve two additio nal donor bound exciton transitions. The excitons have localization en ergies of 3.7 +/- 0.3 and 11.3 +/- 05 meV. respectively. Using Haynes rule the respective donors lie 56.5 and 18.5 meV below the conduction band. The applicability of Haynes rule could nicely be confirmed by IR absorption where the 1s-2p transition of the 34.5 and 58 meV donor ar e observed. The issue of residual donors in GaN will be discussed in t his contest. (C) 1997 Elsevier Science S.A.