A novel method for in-situ investigation of patterned magnetic domain struc
tures is presented. Micron-length scales of permalloy thin film fabricated
by a lift-off process using electron beam lithography were placed on the to
p and adjacent to an Aluminum strip. A magnetic force microscope was used t
o take continuous images of the patterned permalloy films while an electric
al current was applied in the aluminum strip, with which a magnetic field w
as established through the patterned permalloy films in the perpendicular a
nd plane direction. As a result, changes of the magnetic domain structures
were observed in the presence of the applied magnetic field.