Tribological characteristics of SiNx films

Citation
Jm. Wen et al., Tribological characteristics of SiNx films, IEEE MAGNET, 35(5), 1999, pp. 2358-2360
Citations number
6
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
IEEE TRANSACTIONS ON MAGNETICS
ISSN journal
00189464 → ACNP
Volume
35
Issue
5
Year of publication
1999
Part
1
Pages
2358 - 2360
Database
ISI
SICI code
0018-9464(199909)35:5<2358:TCOSF>2.0.ZU;2-Z
Abstract
The tribological performance and chemical compositions of thick (75nm-120nm ) amorphous SiNx films are studied with CSS testers and XPS. A high-speed H /D contact program is used to provide intermittent head/disc contacts. Film s with high Si/N ratio (1.25) and high oxygen concentration (22%) have the best durability. Films' durability is also affected by the sputtering condi tions used to prepare films. Higher N-2/Ar ratio will produce lower durabil ity film. The film durability is not sensitive to the total pressure and sp uttering power in the range of 5-15 mTorr and 1-4 kWatt.