Increasing the resistivity of electrodeposited high B-S CoNiFe thin film

In order to increase the resistivity of electrodeposited high B-S CoNiFe th in film, the effect of an organic additive such as diethylenetriamine (DET) added to the plating bath was investigated. The values of rho and H-C were gradually increased as a function of DET concentration. The desirable soft magnetic CoNiFe thin film with rho = 25-90 mu Omega-cm under the condition s of B-S > 1.9 T and H-C < 2.5 Oe was developed as function of carbon in th e deposited films. Additionally, the high resistivity CoNiFe thin film with rho = 130 mu Omega-cm was established under the conditions of B-S = 1.7 T and H-C < 6 Oe.