The lattice parameter (a) of bcc CrX films can be predicted using the weigh
ted average of the Cr and X atomic radius. However, a of the sputtered CrX
film depends strongly on substrate biasing. a of the underlayer can also be
modified using a CrX/Cr dual layer construction with different CrX alloys.
By adjusting the thickness fraction of the CrX layer within the CrX/Cr und
erlayer structure, various a within the upper and lower fraction limits can
be realized. Hence, a can be fine tuned to lattice match the Co-alloy and
enhances the Mrt of the magnetic film.