We have performed in-situ sheet conductance measurements of Co, Cu, Ni80Fe2
0, Ag, and Ta films during their growth on NiO or SiO2 surfaces. The specul
arity and the roughness of the films are determined based on the Fuchs-Namb
a model, The roughness from the Fuchs-Namba model are compared with that me
asured by AFM. The material dependence of specularity is obtained. No appre
ciable difference in specularity has been found when the magnetic films are
deposited on NiO or SiO2 surfaces.