In-situ conductance measurement of surface specularity of NiFe, Co, Cu, Agand Ta thin films

Citation
K. Yamada et al., In-situ conductance measurement of surface specularity of NiFe, Co, Cu, Agand Ta thin films, IEEE MAGNET, 35(5), 1999, pp. 2979-2981
Citations number
11
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
IEEE TRANSACTIONS ON MAGNETICS
ISSN journal
00189464 → ACNP
Volume
35
Issue
5
Year of publication
1999
Part
1
Pages
2979 - 2981
Database
ISI
SICI code
0018-9464(199909)35:5<2979:ICMOSS>2.0.ZU;2-P
Abstract
We have performed in-situ sheet conductance measurements of Co, Cu, Ni80Fe2 0, Ag, and Ta films during their growth on NiO or SiO2 surfaces. The specul arity and the roughness of the films are determined based on the Fuchs-Namb a model, The roughness from the Fuchs-Namba model are compared with that me asured by AFM. The material dependence of specularity is obtained. No appre ciable difference in specularity has been found when the magnetic films are deposited on NiO or SiO2 surfaces.