Enhanced Kerr rotation in electrodeposited nickel films

Citation
K. Attenborough et al., Enhanced Kerr rotation in electrodeposited nickel films, IEEE MAGNET, 35(5), 1999, pp. 2985-2987
Citations number
12
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
IEEE TRANSACTIONS ON MAGNETICS
ISSN journal
00189464 → ACNP
Volume
35
Issue
5
Year of publication
1999
Part
1
Pages
2985 - 2987
Database
ISI
SICI code
0018-9464(199909)35:5<2985:EKRIEN>2.0.ZU;2-B
Abstract
High quality nickel films were electrodeposited directly onto n-GaAs using galvanostatic control. It was seen that by varying the current density the crystallographic orientation of the films could be controlled. For a curren t density of 15 mA/cm(2), a highly dominant (220) crystallographic orientat ion was obtained, Magnetic measurements revealed a strong uniaxial anisotro py in these films, Moreover, Kerr spectroscopy measurements (1.4 to 4.5 eV) showed an enhanced Kerr rotation of -0.17 degrees at 3.2 eV, which may be attributed to the strong magnetic anisotropy and the exceptional crystal qu ality of the films.