C. Tindall et al., EFFECT OF SURFACE POLARITY ON GALLIUM ADSORPTION ON 6H-SIC(0001) SURFACES - AN STM STUDY, Science Reports of the Research Institutes, Tohoku University, Series A: Physics, Chemistry, and Metallurgy, 44(1), 1997, pp. 95-98
Citations number
11
Categorie Soggetti
Material Science","Metallurgy & Metallurigical Engineering
We have performed the first STM study of gallium adsorption on both th
e Si and C terminated 6H-SiC(0001) surfaces. The development of surfac
e structures was followed as a function Ga coverage. On both the Si-te
rminated root 3 x root 3 and C-terminated 2 root 3 x 2 root 3 surfaces
, coverages of less than 1/2 ML resulted in a disordered phase. Increa
sing the coverage to greater than 1/2, but less than 1 ML produced ord
ered phases. On the Si-terminated side this consisted of parallel rows
of Ga atoms arranged in three different domains, oriented at angles o
f 120 degrees with respect to each other. Thus the surface symmetry wa
s reduced from three-fold to two-fold. On the C-terminated side, it co
nsisted of interlocking rings of 12 atoms, which appear alternately br
ight and dark in the STM image. Thus the original threefold symmetry o
f the SIC surface was preserved. On both surfaces, full monolayer cove
rage led to the formation of the (1x1)Ga structure.