Surface morphologies of BaTiO3 thin films have been studied by atomic
force microscopy (AFM). The films on (111)InSb, indium tin oxide (ITO)
-coated glass and (100)Si substrates are deposited by in-situ metalorg
anic chemical vapor deposition (MOCVD) at different deposition tempera
tures of 300-degrees-C, 400-degrees-C and 600-degrees-C, respectively.
AFM under ambient conditions showed that the BaTiO3 film deposited on
the ITO-coated glass had a smooth surface consisting of large hemisph
erical grains, while the film on (100)Si had a slightly rough surface
with [110]textured rectangular grains. As-grown film on the (111)InSb
substrate was in the amorphous phase except near the interface, result
ing in a rough surface. Our results of dependence on the kind of subst
rates and growth temperature suggest that the surface morphology of th
e as-grown films is strongly influenced by the crystallinity and growi
ng characteristic of the film. For low-temperature growth below the de
position temperature of 600-degrees-C, surface roughness of the BaTiO3
film is strongly dependent on growth temperature rather than crystall
inity of the films related to substrates.