H-2(+) scattered off Al surfaces: The role of the negative ion resonance (2)Sigma(+)(u)

Citation
N. Lorente et al., H-2(+) scattered off Al surfaces: The role of the negative ion resonance (2)Sigma(+)(u), J CHEM PHYS, 111(15), 1999, pp. 7075-7083
Citations number
48
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
JOURNAL OF CHEMICAL PHYSICS
ISSN journal
00219606 → ACNP
Volume
111
Issue
15
Year of publication
1999
Pages
7075 - 7083
Database
ISI
SICI code
0021-9606(19991015)111:15<7075:HSOAST>2.0.ZU;2-N
Abstract
A theoretical study of the electronic processes occurring in collisions of H-2(+) molecular ions on an Al surface is presented, with an emphasis on th e molecular dissociation induced by electronic transitions. The H-2(+) neut ralization proceeds through two different channels: the H-2 (b (3)Sigma(u)( +)) dissociative state (resonant process) and the H-2 (X (1)Sigma(g)(+)) gr ound state (Auger process). The Auger deexcitation process of the b state, mediated by the H-2(-) ((2)Sigma(u)) resonant state is studied in detail an d shown to result in an efficient quenching of the excited state and a redu ction in the molecular dissociation probability. Its efficiency depends on the competition between the molecular dissociation and the electronic proce ss. The importance of this process can explain the experimental observation of significant amounts of bound H-2 molecules surviving the electronic pro cesses. (C) 1999 American Institute of Physics. [S0021-9606(99)70239-4].