Internal friction of artificially multilayered Cu-Ni(100) membranes produced by electrodeposition

The internal stress and internal friction of electrodeposited multilayered Cu-Ni(100) thin films were investigated as a function of temperature by a s ensitive vibrating membrane technique. Each membrane was in a state of biax ial stress (approaching the yield strength) resulting from contributions of the growth stress in the as-deposited film and from the thermal stress as the membrane was heated. The measured internal friction of these stressed m ultilayered films was enhanced by over an order of magnitude compared to th e predicted value of classic damping related to the modulus defect when the effect of the internal stress was taken into account.