Thin film materials are normally under residual stresses as a result of fab
rication processes. Unlike microelectronics devices, a micromechanical stru
cture is no longer constrained by its underlying silicon substrate after an
isotropic etch undercutting; therefore, residual stresses may result in the
bending and buckling of a micromechanical structure. The buckling behavior
has been exploited to measure the residual stresses of thin films. This ch
aracteristic can also be applied to fabricate out-of-plane three-dimensiona
l micromechanical structures if their deflections are controllable. The buc
kling of a microbridge is difficult to predict since it is strongly dominat
ed by its fabrication processes and boundary conditions. Currently the info
rmation regarding the buckling of micromachined structures is still not com
plete. The application of the buckling behavior is therefore limited. In th
is research, the effects of boundary conditions and gradient residual stres
ses on the buckling behavior of microbridges were studied using analytical
and experimental approaches. The variations of the buckling amplitude orien
tations with the thickness and length of the microbridges were obtained; th
erefore, the buckling behavior can be predicted and then exploited to fabri
cate useful micromechanical structures. The potential application of this r
esearch lies in preventing the leakage of the microvalves.