Novel scanning near-field optical microscopy/atomic force microscope probes by combined micromachining and electron-beam nanolithography

We have developed novel probes which allow scanning near-field optical micr oscopy to be performed in a conventional atomic force microscope (AFM). Dir ect-write electron-beam lithography and silicon micromachining have been us ed in a reliable batch process which allows the production of many probes a t once without resort to handicraft. The aperture is situated at the hollow tip apex of a conventional silicon nitride AFM cantilever. Since there is no waveguide cutoff, the overall light throughput is dramatically enhanced. The integration of a conventional force microscope cantilever with the ape rture allows more reliable and better control of the aperture-sample distan ce than that obtained by "shear-force" detection. In addition, since the ap ertures are defined by lithographic means, the size and shape of apertures are well controlled and reproducible. We present the first results of near- field optical imaging and luminescence imaging using these probes demonstra ting excellent light throughput and also good spatial and spectral resoluti on. (C) 1999 American Vacuum Society. [S0734-211X(99)00905-1].