Extreme ultraviolet emission of laser-produced plasmas using a cryogenic xenon target

Citation
G. Schriever et al., Extreme ultraviolet emission of laser-produced plasmas using a cryogenic xenon target, J VAC SCI B, 17(5), 1999, pp. 2058-2060
Citations number
17
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
ISSN journal
10711023 → ACNP
Volume
17
Issue
5
Year of publication
1999
Pages
2058 - 2060
Database
ISI
SICI code
1071-1023(199909/10)17:5<2058:EUEOLP>2.0.ZU;2-2
Abstract
In this article we show that laser-produced plasmas using a cryogenic xenon target are emitters of pulsed broadband extreme ultraviolet radiation with an intensity maximum around 11 nm. The photon flux and conversion efficien cy (CE) of this source is comparable to the emission of laser-produced plas mas of solid state targets using elements with high atomic numbers. The CE of the laser-produced xenon plasma in a 2% wavelength band at the beryllium absorption K edge at 11.1 nm is about two times higher compared to the CE at the silicon absorption L edge at 12.4 nm. (C) 1999 American Vacuum Socie ty.