Initial stages of Sb-mediated growth of Ge on Si(100): A first-principles study

Citation
M. Jiang et al., Initial stages of Sb-mediated growth of Ge on Si(100): A first-principles study, PHYS REV B, 60(11), 1999, pp. 8171-8177
Citations number
26
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
PHYSICAL REVIEW B-CONDENSED MATTER
ISSN journal
01631829 → ACNP
Volume
60
Issue
11
Year of publication
1999
Pages
8171 - 8177
Database
ISI
SICI code
0163-1829(19990915)60:11<8171:ISOSGO>2.0.ZU;2-Q
Abstract
The initial stages of Sb-mediated growth of Ge on Si(100) surface is studie d using first-principles calculations. The bonding geometry and electronic configurations are investigated after a single Ge atom, a single Ge dimer, and two Ge dimers adsorption in details. Our calculations show that the ads orbed Ge dimers are located between Sb dimer rows. A single Ge dimer hardly alter the neighboring Sb-Sb dimer bond lengths. However, two Ge dimers can greatly weaken the Sb-Sb bonds and initiate the exchange of Ge and Sb atom s. These results are consistent with the experimental observations.