Synthesis and preparation of ionically bound dendrimer monolayers and application toward scanning probe lithography

Citation
Dc. Tully et al., Synthesis and preparation of ionically bound dendrimer monolayers and application toward scanning probe lithography, CHEM MATER, 11(10), 1999, pp. 2892-2898
Citations number
96
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
CHEMISTRY OF MATERIALS
ISSN journal
08974756 → ACNP
Volume
11
Issue
10
Year of publication
1999
Pages
2892 - 2898
Database
ISI
SICI code
0897-4756(199910)11:10<2892:SAPOIB>2.0.ZU;2-K
Abstract
Dendrimer monolayers have been designed for use as positive resists for sca nning probe lithography (SPL). Several new amphiphilic poly(benzyl ether) d endrimers with carboxylic acids at either the focal point or the "periphery " have been prepared. These can form ionically bound dendrimer monolayers t hat may serve as either positive or negative tone resists for SPL. The amph iphilic dendrimers self-assemble onto (3-aminopropyl)silanized Si(100) wafe r surfaces to afford ultrathin films. The dendrimer monolayers were charact erized by AFM, ellipsometry, and contact angle goniometry. Patterning a sin gly charged dendrimer monolayer results in the formation of positive tone h oles similar to 35 nm in width. Similarly, patterning a multiply charged de ndrimer monolayer in a direct-write manner with the scanning probe microsco pe results in the formation of negative tone oxide features similar to 80 n m in width.