SELECTIVE DOPING OF CHEMICALLY SENSITIVE LAYERS ON A MULTISENSING CHIP

Citation
K. Domansky et al., SELECTIVE DOPING OF CHEMICALLY SENSITIVE LAYERS ON A MULTISENSING CHIP, Journal of the Electrochemical Society, 144(4), 1997, pp. 75-78
Citations number
13
Categorie Soggetti
Electrochemistry
ISSN journal
00134651
Volume
144
Issue
4
Year of publication
1997
Pages
75 - 78
Database
ISI
SICI code
0013-4651(1997)144:4<75:SDOCSL>2.0.ZU;2-H
Abstract
A method of selectively doping the polyaniline gates of chemically sen sitive field-effect transistors (CHEMFETs) has been demonstrated. Acti vated and inactivated gates located on the same chip were exposed to a solution containing palladium. The activated gate was doped by pallad ium by the electroless relaxation process I,ut the inactivated gate wa s not modified. High selectivity of the doping process was proved by e xposing the devices to hydrogen. The method has potential applications in manufacturing single-chip heterogeneous microsensor arrays.