Thermoelectric properties of and dopant distribution in SiC thin films

Citation
T. Kawahara et al., Thermoelectric properties of and dopant distribution in SiC thin films, JPN J A P 1, 38(8), 1999, pp. 4852-4856
Citations number
17
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Volume
38
Issue
8
Year of publication
1999
Pages
4852 - 4856
Database
ISI
SICI code
Abstract
We fabricated thin films of p-type SiC by the evaporation technique with me tal dopants such as silver, nickel and copper, which acted as accepters. Th e thermoelectric properties of SiC thin films were measured. These p-type d opants could reduce the resistance of SiC films and improve their performan ce as thermoelectric materials. For samples doped with 5 wt% Ag, the resist ivity is very low compared with those of other samples. The thermoelectric power of the Ag-doped sample shows a temperature dependence in contrast to those of ether samples.