The adhesion of Pt/Ti thin films on SiNx/Si substrates with respect to the
substrate pretreatment and annealing ambient was investigated using the adh
esive tape test, the peel test, and the scratch test. Pt/Ti thin films were
deposited a DC magnetron sputtering system. The in situ Ar+ RF plasma trea
tment was more effective in enhancing adhesion between the Pt/Ti thin films
and the SiNx/Si substrate than chemical cleaning. After annealing in an ox
ygen ambient, the adhesion of the Pt/Ti/SiNx/Si specimen was degraded. This
adhesion degradation was attributed to the depletion of the Ti adhesion la
yer due to the formation of the rutile TiO2 phase.