Vacuum shear force microscopy application to high resolution work

Citation
Vv. Polonski et al., Vacuum shear force microscopy application to high resolution work, JPN J A P 2, 38(7B), 1999, pp. L826-L829
Citations number
14
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Volume
38
Issue
7B
Year of publication
1999
Pages
L826 - L829
Database
ISI
SICI code
Abstract
A new technique-Vacuum Shear Force Microscopy (VSFM)- is introduced as a re liable method for maintaining a constant separation between a probe and sam ple. Elimination of many of the instabilities observed when applying the sh ear force mechanism to imaging under ambient conditions, allows for routine nanometer lateral and sub-nanometer normal resolution. In this paper this technique is applied, firstly, to the imaging of microtubules (biology) and , secondly, to the patterning and subsequent imaging of nanoscale metal lin es (nanofabrication).