A new technique-Vacuum Shear Force Microscopy (VSFM)- is introduced as a re
liable method for maintaining a constant separation between a probe and sam
ple. Elimination of many of the instabilities observed when applying the sh
ear force mechanism to imaging under ambient conditions, allows for routine
nanometer lateral and sub-nanometer normal resolution. In this paper this
technique is applied, firstly, to the imaging of microtubules (biology) and
, secondly, to the patterning and subsequent imaging of nanoscale metal lin
es (nanofabrication).