Two-fold coordinated nitrogen atom: an electron trap in MOS devices with silicon oxynitride as the gate dielectric

Citation
Yn. Morokov et al., Two-fold coordinated nitrogen atom: an electron trap in MOS devices with silicon oxynitride as the gate dielectric, MICROEL ENG, 48(1-4), 1999, pp. 175-178
Citations number
10
Categorie Soggetti
Eletrical & Eletronics Engineeing
Journal title
MICROELECTRONIC ENGINEERING
ISSN journal
01679317 → ACNP
Volume
48
Issue
1-4
Year of publication
1999
Pages
175 - 178
Database
ISI
SICI code
0167-9317(199909)48:1-4<175:TCNAAE>2.0.ZU;2-I
Abstract
Having conducted semiempirical quantum-chemical simulation (MINDO/3) of sev eral clusters at different charge states, we identify that the two-fold coo rdinated nitrogen atom with an un-paired electron (=Si2N .) is the most res ponsible trap center for the observation of large electronic capturing in S iOxNy. Our calculations also show that electron localized in this defect wi ll result in spin dissipation. Trap formation and removal mechanisms during nitridation and re-oxidation are also discussed in this work.