A study of 100 nm channel length asymmetric channel MOSFET by using chargepumping

Citation
S. Mahapatra et al., A study of 100 nm channel length asymmetric channel MOSFET by using chargepumping, MICROEL ENG, 48(1-4), 1999, pp. 193-196
Citations number
4
Categorie Soggetti
Eletrical & Eletronics Engineeing
Journal title
MICROELECTRONIC ENGINEERING
ISSN journal
01679317 → ACNP
Volume
48
Issue
1-4
Year of publication
1999
Pages
193 - 196
Database
ISI
SICI code
0167-9317(199909)48:1-4<193:ASO1NC>2.0.ZU;2-4
Abstract
Lateral Asymmetric Channel (LAC) MOSFETs with channel lengths down to 0.1 m u m have been fabricated and characterized for their electrical performance . Using charge pumping, we show, for the first time, channel V-T profiles o btained experimentally, demonstrating realization of asymmetric channel MOS FETs down to 0.1 mu m channel lengths. Our detailed experimental characteri zations show improved performance for LAC MOSFETs over conventional MOSFETs , in addition to excellent hot-carrier reliability. Based on 2-D device sim ulation results, we attribute the improved hot-carrier reliability in LAC M OSFETs to the reduced peak lateral electric field in the channel.