HIGH-WAVELENGTH-RESOLUTION EXTREME-ULTRAVIOLET MULTILAYER MIRROR

Citation
S. Nagata et al., HIGH-WAVELENGTH-RESOLUTION EXTREME-ULTRAVIOLET MULTILAYER MIRROR, Applied optics, 36(13), 1997, pp. 2830-2838
Citations number
13
Categorie Soggetti
Optics
Journal title
ISSN journal
00036935
Volume
36
Issue
13
Year of publication
1997
Pages
2830 - 2838
Database
ISI
SICI code
0003-6935(1997)36:13<2830:HEMM>2.0.ZU;2-J
Abstract
Multilayer mirrors with a system wavelength resolution (lambda/Delta l ambda) as high as 3050 are required for the diagnostics of cosmic plas mas with temperatures of 1-20 MK. Such a high wavelength resolution ca n be realized by increasing the number of layer pairs contributing to the reflectance, by selecting less-absorbing materials for both the re flector and the spacer, and by decreasing the thickness of the reflect or. We have fabricated a multilayer mirror tuned to 284 Angstrom with a silicon carbide reflector (20% thickness of the layer period) and an aluminum spacer and achieved lambda/Delta lambda similar to 26.8 with a peak reflectivity of similar to 13.0%. This wavelength resolution i s close to the value obtained with a numerical simulation and is consi derably higher than the value obtained with the conventional Mo/Si mul tilayer. (C) 1997 Optical Society of America.