COMPARISON OF THE EXPOSURE CHARACTERISTICS OF SOFT-X-RAY FILM SIOFM-5FW WITH KODAK-101-05 AND ILFORD Q-PLATES

In identical exposure and processing conditions, we compare the exposu re characteristics of soft-x-ray film, SIOFM-5FW, with Kodak101-05 and Ilford Q-plates in the soft-x-ray and extreme UV region below 100 nm, using D-19 and Phenisol developers. The experimental results show tha t for radiation greater than 10 nm, the response of SIOFM-5FW lies bet ween the Kodak101-05 and the Ilford Q-plates but is closer to the form er. For radiation of less than 10 nm, the SIOFM-5FW is more sensitive than the Kodak101-05 plate, with a higher saturated optical density, a higher dynamic range, and an obvious carbon K absorption edge structu re in the spectra obtained. The effects of the two developers used on the exposure characteristics are discussed. (C) 1997 Optical Society o f America.