We report on reflection gratings produced entirely of dielectric materials.
This gives the opportunity to enhance the laser damage threshold over that
occurring in conventional metal gratings used for chirped-pulse-amplificat
ion, high-power lasers. The design of the system combines a dielectric mirr
or and a well-defined corrugated top layer to obtain optimum results. The r
ules that have to be considered for the design optimization are described.
We optimized the parameters of a dielectric grating with a binary structure
and theoretically obtained 100% reflectivity for the -1 order in the Littr
ow mounting for a 45 degrees angle of incidence. Subsequently we fabricated
gratings by structuring a low-refractive-index top layer of a multilayer s
tack with electron-beam lithography. The multilayer system was fabricated b
y conventional sputtering techniques onto a flat fused-silica substrate. Th
e parameters of the device were measured and controlled by light scatterome
ter equipment. We measured 97% diffraction efficiency in the -1 order and d
amage thresholds of 4.4 and 0.18 J/cm(2) with 5-ns and 1-ps laser pulses, r
espectively, at a wavelength of 532 nm in working conditions. (C) 1999 Opti
cal Society of America.