Efficient Auger-excitation of erbium electroluminescence in reversely-biased silicon structures

Citation
Ms. Bresler et al., Efficient Auger-excitation of erbium electroluminescence in reversely-biased silicon structures, APPL PHYS L, 75(17), 1999, pp. 2617-2619
Citations number
11
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS LETTERS
ISSN journal
00036951 → ACNP
Volume
75
Issue
17
Year of publication
1999
Pages
2617 - 2619
Database
ISI
SICI code
0003-6951(19991025)75:17<2617:EAOEEI>2.0.ZU;2-E
Abstract
In p-n junctions based on c-Si:Er, we have observed strongly efficient exci tation of erbium electroluminescence at 1.54 mu m. Excitation of erbium ion s is accompanied by strong recombination of free carriers indicating a part icipation of an Auger mechanism. A possible excitation mechanism is propose d which is the Auger recombination of electrons occupying the upper subband of the conduction band with free holes in the valence band, whereas the en ergy of the recombination process is transferred by Coulomb interaction to 4f electrons of an erbium ion transmitting it to the second excited state I -4(11/2) (excitation energy 1.26 eV). The observed three-level excitation o f erbium ions is promising for the development of a Si:Er laser. (C) 1999 A merican Institute of Physics. [S0003-6951(99)04343-0].