Inverse Nottingham effect cooling in semiconductors

Authors
Citation
R. Tsu et Rf. Greene, Inverse Nottingham effect cooling in semiconductors, EL SOLID ST, 2(12), 1999, pp. 645-647
Citations number
22
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
ELECTROCHEMICAL AND SOLID STATE LETTERS
ISSN journal
10990062 → ACNP
Volume
2
Issue
12
Year of publication
1999
Pages
645 - 647
Database
ISI
SICI code
1099-0062(199912)2:12<645:INECIS>2.0.ZU;2-W
Abstract
The inverse Nottingham effect is a cooling scheme involving vacuum emission from the conduction band of p-type semiconductors designed in such a way t hat electrons are pulled off from above the Fermi level into the vacuum via either field emission or via resonant tunneling into the vacuum. The reple nishment from the valence band for the restoration of thermal equilibrium r esults in cooling. Resonant tunneling promotes efficient tunneling into the vacuum with energy selection, thereby preventing tunneling to take place b elow the Fermi level and thus preventing heating. Our numerical model gives a conservative estimate of the cooling current of 360 W/cm(2) at 300 K for Si with even higher values for GaAs and GaN. (C) 1999 The Electrochemical Society. S1099-0062(99)07-039-X. All rights reserved.