We investigated the relationship between the film characteristics and the s
puttering rate of the MgO protecting layer in AC-PDP. As possible elements
for determining the sputtering rate, we considered the density, orientation
, and surface morphology. With respect to the orientation, we found that th
e sputtering rate increased for the sequence of (200) < (220) < (111). Howe
ver, we noticed that orientation and surface structure are not really decis
ive factors affecting the sputtering rate; the density of the film is most
important.