M. Takahashi et N. Koshida, Fabrication and characteristics of three-dimensionally buried porous silicon optical waveguides, J APPL PHYS, 86(9), 1999, pp. 5274-5278
A fabrication technology of three-dimensionally buried porous silicon (PS)
optical waveguide with an extremely high refractive index contrast is prese
nted, including its fundamental properties. The origins of attenuation loss
es are investigated by experimental and theoretical analyses in terms of mi
croscopic observations, edge emission measurements, polarization mode deter
mination of guided wave, and evaluation of bending loss. The results of the
se studies indicate that attenuation losses in PS waveguides are due to sel
f-absorption by residual silicon, structural and optical inhomogeneities in
the core region, and roughness at interfaces between the core and the clad
ding layers. Some possible ways for reducing these attenuation losses are d
iscussed. It is also demonstrated that a buried bent PS waveguide with an e
xtremely small curvature of 250 mu m can be fabricated by simple planar pro
cessing, and that a visible optical wave propagates along it owing to a sig
nificantly high refractive index contrast between the core and the cladding
layers. (C) 1999 American Institute of Physics. [S0021-8979(99)01321-3].