Bc. Li et al., Complete thermal characterization of film-on-substrate system by modulatedthermoreflectance microscopy and multiparameter fitting, J APPL PHYS, 86(9), 1999, pp. 5314-5316
Modulated thermoreflectance microscopy is applied to a complete thermal cha
racterization of a thin film of gold (78 nm) or YBaCuO (300 nm) on a LaAlO3
substrate. The phase profile, measured at several modulation frequencies c
overing an appropriate range, is fitted with a rigorous thermal diffusion m
odel. This leads to a simultaneous estimation of the thermal diffusivities
of the film and the substrate, as well as of the thermal film/substrate bou
ndary resistance. The estimated values for the gold film sample are, respec
tively, 4.3x10(-6) m(2) s(-1) (substrate diffusivity), 1.0x10(-4) m(2) s(-1
) (film diffusivity), and 1.0x10(-8) m(2) KW-1 (thermal boundary resistance
), while for the thermally anisotropic YBaCuO film sample are, 4.1x10(-6) m
(2) s(-1), 3.5x10(-6) m(2) s(-1) (in-plane diffusivity), and 8.0x10(-8) m(2
) KW-1, respectively. (C) 1999 American Institute of Physics. [S0021-8979(9
9)08218-3].