Kh. Becker et al., The reactions of OH radicals with di-i-propoxymethane and di-sec-butoxymethane: Kinetic measurements and structure activity relationships, PCCP PHYS C, 1(20), 1999, pp. 4721-4726
The gas-phase reactions of OH(X(2)Pi) radicals with di-i-propoxymethane (Di
PM) and di-sec-butoxymethane (DsBM) have been studied in argon in the tempe
rature range 295-700 K at total pressures between 50 and 400 Torr. OH radic
als were generated by excimer laser photolysis of H2O2 and were detected by
laser-induced fluorescence. Within the investigated ranges, the reactions
of OH(X(2)Pi) radicals with DiPM and DsBM were found to be independent of t
otal pressure. Weak dependencies of the rate coefficients on temperature we
re observed. Bimolecular rate coefficients for the reactions of OH(X(2)Pi)
with DiPM and DsBM at 298 K of k(OH+DiPM)=(3.47 +/- 0.20)x10(-11) cm(3) s(-
1) and k(OH+DsBM)=(4.25 +/- 0.13)x10(-11) cm(3) s(-1), respectively, have b
een determined. In order to describe the kinetics of the reactions of OH ra
dicals with DiPM and DsBM as well as analogous acetals, a structure activit
y relationship (SAR) technique established for other reactant classes has b
een modified and applied. Compared to the former SAR method, which does not
yield satisfying results for oxygenated VOCs (volatile organic compounds),
the present calculations lead to much better agreement with the experiment
al data for dialkylacetals of the type R-O-CH2-O-R.