The mechanism for the high-quality single-phase growth of MnSi films on Si(111) in the presence of Sb flux

Citation
Y. Yan et al., The mechanism for the high-quality single-phase growth of MnSi films on Si(111) in the presence of Sb flux, APPL PHYS L, 75(19), 1999, pp. 2894-2896
Citations number
21
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS LETTERS
ISSN journal
00036951 → ACNP
Volume
75
Issue
19
Year of publication
1999
Pages
2894 - 2896
Database
ISI
SICI code
0003-6951(19991108)75:19<2894:TMFTHS>2.0.ZU;2-3
Abstract
The microstructures of high-quality single-phase MnSi layers grown on Si (1 11) by Mn deposition and reaction with Si in the presence of Sb flux are ch aracterized by Z-contrast imaging. It is found that there is a transition l ayer consisting of two Sb monolayers sandwiching a Mn layer in between the Si substrate and the single-phase MnSi film. This Sb-Mn-Sb sandwich layer e ffectively prevents deposited Mn atoms from direct reaction with Si atoms i n the substrate to form Mn silicides. This explains why high-quality single -phase MnSi layers can be grown with remarkably smooth interface on Si (111 ) substrates. (C) 1999 American Institute of Physics. [S0003-6951(99)01645- 9].