GaN epitaxial lateral overgrowth and optical characterization

Citation
X. Li et al., GaN epitaxial lateral overgrowth and optical characterization, APPL PHYS L, 73(9), 1998, pp. 1179-1181
Citations number
11
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS LETTERS
ISSN journal
00036951 → ACNP
Volume
73
Issue
9
Year of publication
1998
Pages
1179 - 1181
Database
ISI
SICI code
0003-6951(199808)73:9<1179:GELOAO>2.0.ZU;2-O
Abstract
We demonstrate the epitaxial lateral overgrowth (ELO) of GaN from narrow st ripes with triangular cross sections by atmospheric pressure metal organic chemical vapor deposition, and characterize the optical properties of these stripes at each stage of the growth using spatially resolved cathodolumine scence spectroscopy, wavelength imaging, and line scans. An improvement of the optical quality of the GaN materials grown by the ELO technique is clea rly shown by the appearance of a free exciton peak, the enhancement of band edge emission, and the weakening of the yellow emission. (C) 1998 American Institute of Physics.