Green photoluminescence from cubic In0.4Ga0.6N grown by radio frequency plasma-assisted molecular beam epitaxy

Citation
Jr. Mullhauser et al., Green photoluminescence from cubic In0.4Ga0.6N grown by radio frequency plasma-assisted molecular beam epitaxy, APPL PHYS L, 73(9), 1998, pp. 1230-1232
Citations number
23
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS LETTERS
ISSN journal
00036951 → ACNP
Volume
73
Issue
9
Year of publication
1998
Pages
1230 - 1232
Database
ISI
SICI code
0003-6951(199808)73:9<1230:GPFCIG>2.0.ZU;2-W
Abstract
We investigate the structural and optical properties of a cubic (In, Ga)N/G aN/(Al, Ga)N heterostructure containing a 185 nm thick In0.4Ga0.6N layer wh ich dominates the optical properties of the sample. The phase purity of the structure is verified by means of transmission electron microscopy while t he In content is measured by x-ray diffraction and secondary ion mass spect rometry. The room-temperature band gap of the In0.4Ga0.6N layer is determin ed by transmission and reflectance measurements to be 2.46 +/- 0.03 eV. Thi s value agrees with the spectral position of the dominating green photolumi nescence at 300 K. (C) 1998 American Institute of Physics. [S0003-6951(98)0 0735-9].