A field emitter array with an amorphous silicon thin-film transistor on glass

Citation
H. Gamo et al., A field emitter array with an amorphous silicon thin-film transistor on glass, APPL PHYS L, 73(9), 1998, pp. 1301-1303
Citations number
8
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS LETTERS
ISSN journal
00036951 → ACNP
Volume
73
Issue
9
Year of publication
1998
Pages
1301 - 1303
Database
ISI
SICI code
0003-6951(199808)73:9<1301:AFEAWA>2.0.ZU;2-C
Abstract
We have designed and fabricated a field emitter array (FEA) with an amorpho us silicon thin-film transistor (a-Si TFT) monolithically, as an emission c ontrol device, bn a glass substrate. The TFT was fabricated on the glass su bstrate at a low temperature, less than 350 degrees C. The measured emissio n characteristics showed that the FEA had saturated emission currents with the aid of the a-Si TFT; thus the a-Si TFT is expected to stabilize the emi ssion current. The emission current of the FEA was controlled in the range of 0-0.12 mu A With the TFT-gate voltage from 0 to 15 V. (C) 1998 American Institute of Physics. [S0003-6951(98)02435-8].