Very high gain millimeter-wave InAlAs/InGaAs/GaAs metamorphic HEMT's

Citation
Kc. Hwang et al., Very high gain millimeter-wave InAlAs/InGaAs/GaAs metamorphic HEMT's, IEEE ELEC D, 20(11), 1999, pp. 551-553
Citations number
11
Categorie Soggetti
Eletrical & Eletronics Engineeing
Journal title
IEEE ELECTRON DEVICE LETTERS
ISSN journal
07413106 → ACNP
Volume
20
Issue
11
Year of publication
1999
Pages
551 - 553
Database
ISI
SICI code
0741-3106(199911)20:11<551:VHGMIM>2.0.ZU;2-R
Abstract
We report the first demonstration of W-band metamorphic HEMT's/LNA MMIC's u sing an AlGaAsSb lattice strain relief buffer layer on a GaAs substrate. 0. 1 x 50 mu m low-noise devices have shown typical extrinsic transconductance of 850 mS/mm with high maximum drain current of 700 mA/mm and gate-drain b reakdown voltage of 4.5 V. Small-signal S-parameter measurements performed on the 0.1-mu m devices exhibited an excellent f(T) of 225 GHz and maximum stable gain (MSG) of 12.9 dB at 60 GHz and 10.4 db at 110 GHz. The three-st age W-band LNA MMIC exhibits 4.2 db noise figure with 18 dB gain at 82 GHz and 4.8 dB noise figure with 14 dB gain at 89 GHz. The gain and noise perfo rmance of the metamorphic HEMT technology is very close to that of the InP- based HEMT.