Viscous effects on motion and heating of electrons in inductively coupled plasma reactors

Authors
Citation
Ch. Chang et D. Bose, Viscous effects on motion and heating of electrons in inductively coupled plasma reactors, IEEE PLAS S, 27(5), 1999, pp. 1310-1316
Citations number
23
Categorie Soggetti
Physics
Journal title
IEEE TRANSACTIONS ON PLASMA SCIENCE
ISSN journal
00933813 → ACNP
Volume
27
Issue
5
Year of publication
1999
Pages
1310 - 1316
Database
ISI
SICI code
0093-3813(199910)27:5<1310:VEOMAH>2.0.ZU;2-7
Abstract
A transport model is developed for nonlocal effects on motion and heating o f electrons in inductively coupled plasma reactors. The model is based on t he electron momentum equation derived from the Boltzmann equation, retainin g anisotropic stress components which in fact are viscous stresses. The res ulting model consists of transport equations for the magnitude of electron velocity oscillation and terms representing energy dissipation due to visco us stresses in the electron energy equation. In this model, electrical curr ent is obtained in a nonlocal manner due to viscous effects, instead of Ohm 's law or the electron momentum equation without viscous effects, while non local heating of electrons is represented by the viscous dissipation. Compu tational results obtained by two-dimensional numerical simulations show tha t nonlocal determination of electrical current indeed is important, and vis cous dissipation becomes an important electron heating mechanism at low pre ssures, It is suspected that viscous dissipation in inductively coupled pla sma reactors in fact represents stochastic heating of electrons, and this p ossibility is exploited by discussing physical similarities between stochas tic heating and energy dissipation due to the stress tensor.