Ch. Chang et D. Bose, Viscous effects on motion and heating of electrons in inductively coupled plasma reactors, IEEE PLAS S, 27(5), 1999, pp. 1310-1316
A transport model is developed for nonlocal effects on motion and heating o
f electrons in inductively coupled plasma reactors. The model is based on t
he electron momentum equation derived from the Boltzmann equation, retainin
g anisotropic stress components which in fact are viscous stresses. The res
ulting model consists of transport equations for the magnitude of electron
velocity oscillation and terms representing energy dissipation due to visco
us stresses in the electron energy equation. In this model, electrical curr
ent is obtained in a nonlocal manner due to viscous effects, instead of Ohm
's law or the electron momentum equation without viscous effects, while non
local heating of electrons is represented by the viscous dissipation. Compu
tational results obtained by two-dimensional numerical simulations show tha
t nonlocal determination of electrical current indeed is important, and vis
cous dissipation becomes an important electron heating mechanism at low pre
ssures, It is suspected that viscous dissipation in inductively coupled pla
sma reactors in fact represents stochastic heating of electrons, and this p
ossibility is exploited by discussing physical similarities between stochas
tic heating and energy dissipation due to the stress tensor.