Miniaturization of inductively coupled plasma sources

The sealing laws associated with the miniaturization of planar inductively coupled plasmas (ICP's) are investigated. The applications for miniature IC P's include microelectromechanical systems (MEMS) for chemical analysis and micro ion propulsion systems. Langmuir probe and microwave interferometry measurements of three ICP's with spiral-shaped coil diameters of 5, 10, and 15 mm show that electron density typically falls in the range of 10(16)-10 (17) m(-3). The electron density is about an order of magnitude lower than large-scale ICP's as a result of the large surface to-volume ratio of small discharges. The measured electron temperature is higher than predicted by a simple "global model" unless the plasma dimensions are determined more pr ecisely by subtracting the sheath width from the chamber dimensions. Since the sheath width does not scale with the plasma size, the sheath width may ultimately limit the minimum size of ICP's, Plasma initiation power is dete rmined to have a minimum at a gas pressure for which the electron collision frequency equals the frequency of the RF power supply, Small scale ICP's o perating at 460 MHz can therefore be started most easily at similar to 1 to rr The design of the coil is critical to miniature ICP performance, Unlike large-scale ICP's that operate efficiently using a broad range of coil shap es, the miniature coil must be carefully designed and constructed to minimi ze parasitic resistance.