Selective adsorption of metallocenes on clean and chemically modified Si(111) surfaces

Authors
Lin, JL Rauscher, H Kirakosian, A Himpsel, FJ Dowben, PA
Citation
Jl. Lin et al., Selective adsorption of metallocenes on clean and chemically modified Si(111) surfaces, J APPL PHYS, 86(10), 1999, pp. 5492-5496
Citations number
34
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JOURNAL OF APPLIED PHYSICS
ISSN journal
00218979 → ACNP
Volume
86
Issue
10
Year of publication
1999
Pages
5492 - 5496
Database
ISI
SICI code
0021-8979(19991115)86:10<5492:SAOMOC>2.0.ZU;2-V
Abstract
Metallocene adsorption on clean Si(111) and CaF2/CaF1/Si(111) substrates ha s been investigated with scanning tunneling microscopy. The surface chemica l composition is found to strongly change the adsorption site selectivity, leading to an enhanced edge selectivity on modified substrates. Templates w ith well-defined local chemical reactivity have been created via self-assem bly. The selective adsorption of metallocenes on such tailored substrates f acilitates patterning ordered arrays of magnetic nanowires and stripes on t he single digit nanometer scale. (C) 1999 American Institute of Physics. [S 0021-8979(99)01822-8].