193 nm photodissociation of thiophene probed using synchrotron radiation

Citation
F. Qi et al., 193 nm photodissociation of thiophene probed using synchrotron radiation, J PHYS CH A, 103(42), 1999, pp. 8351-8358
Citations number
32
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
JOURNAL OF PHYSICAL CHEMISTRY A
ISSN journal
10895639 → ACNP
Volume
103
Issue
42
Year of publication
1999
Pages
8351 - 8358
Database
ISI
SICI code
1089-5639(19991021)103:42<8351:1NPOTP>2.0.ZU;2-Y
Abstract
The photodissociation dynamics of thiophene, c-C4H4S, have been studied at 193 nm using tunable synchrotron undulator radiation as a universal product probe. Five primary dissociation channels have been observed, and the tran slational energy distributions and photoionization efficiency spectra have been recorded for all products. The evidence suggests that dissociation occ urs on the ground-state surface following internal conversion.