Liquid deposition of hydrogenated carbon films in N,N-dimethyl formamide solution

Citation
Jt. Jiu et al., Liquid deposition of hydrogenated carbon films in N,N-dimethyl formamide solution, MATER LETT, 41(2), 1999, pp. 63-66
Citations number
17
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
MATERIALS LETTERS
ISSN journal
0167577X → ACNP
Volume
41
Issue
2
Year of publication
1999
Pages
63 - 66
Database
ISI
SICI code
0167-577X(199910)41:2<63:LDOHCF>2.0.ZU;2-Z
Abstract
Using a pulse-modulated source, an attempt has been made to deposit diamond -like carbon films by electrodeposition in N,N-dimethyl formamide (DMF) sol ution. XPS showed the films mainly contain carbon. IR spectrum indicated th at as-deposited films are hydrogenated carbon films, and Che hydrogen mainl y bonded to sp(3) carbon. Raman spectroscopy suggested that the films conta ined a mixture of sp(3) and sp(2) carbon. For the first time, we obtained R aman scattering at 1337 cm(-1), which is very close to the characteristic R aman line of diamond located at 1332 cm(-1) except for the large linewidth. The electrical resistivity of the films is more than 10(10) Omega cm. (C) 1999 Elsevier Science B.V. All rights reserved.