Extended x-ray-absorption fine-structure has been utilized to measure the c
omposition dependence of the Ge-Ge and Ge-Si bond lengths in both crystalli
ne and amorphous GexSi1-x alloys. Utilizing a new sample preparation techni
que, transmission measurements were performed over greater ranges of photoe
lectron momentum and composition and with lesser uncertainty than previousl
y reported. As a consequence, the proposed increase in bond length as a fun
ction of Ge composition has been unambiguously verified for the crystalline
GexSi1-x alloys. For amorphous material, experimental results were also co
nsistent with a bond length composition dependence and a phase-independent
topological rigidity parameter. Though of greater uncertainty, the experime
ntal values of Ge-Si bond length exhibited a lesser composition dependence
than the Ge-Ge results. [S0163-1829(99)08339-3].