High resolution XPS investigation of photocured films containing perfluoropolyether acrylates

Citation
R. Bongiovanni et al., High resolution XPS investigation of photocured films containing perfluoropolyether acrylates, POLYMER, 41(2), 2000, pp. 409-414
Citations number
12
Categorie Soggetti
Organic Chemistry/Polymer Science
Journal title
POLYMER
ISSN journal
00323861 → ACNP
Volume
41
Issue
2
Year of publication
2000
Pages
409 - 414
Database
ISI
SICI code
0032-3861(200001)41:2<409:HRXIOP>2.0.ZU;2-#
Abstract
The paper reports an XPS investigation on films obtained by photopolymerisi ng new perfluoropolyether methacrylates as pure products or added in low am ounts to a typical UV-curable resin (Bisphenol A bis-ethylether diacrylate) . The structure of the fluorinated monomers is Rf-Rh type, where Rh = -CH2O -CO-NH-CH2-CH2-OCOC(CH3) = CH2 while Rf = CF3-CF2O-(CF2O)(n)(CF2-CF2O)(m)-C F2- for monomer 1 (PM 890, m/n = 1.68), and Rf = Cl-CF2-CF(CF3)-O-(CF2CF(CF 3)-O)(2)-CF2- for monomer 2. Quantitative evaluation of the different atomi c ratios was performed using take-off angles of 45 and 10 degrees (very sur face region) on both film sides, the one in contact with the glass substrat e and the one exposed to air. The results obtained indicate strong fluorine enrichment on the air side of the films and a concentration gradient at th e surface, while the glass side has a composition similar to the bulk. (C) 1999 Elsevier Science Ltd. All rights reserved.